	US 12,291,541 B2
	Compound, thin-film forming raw material, and method of producing thin-film
Akio Saito, Tokyo (JP); and Yutaro Aoki, Tokyo (JP)
Assigned to ADEKA CORPORATION, Tokyo (JP)
Appl. No. 17/775,716
Filed by ADEKA CORPORATION, Tokyo (JP)
PCT Filed Nov. 16, 2020, PCT No. PCT/JP2020/042597 § 371(c)(1), (2) Date May 10, 2022, PCT Pub. No. WO2021/106652, PCT Pub. Date Jun. 3, 2021.
Claims priority of application No. 2019-214264 (JP), filed on Nov. 27, 2019.
Prior Publication US 2022/0396590 A1, Dec. 15, 2022
Int. Cl. C07F 5/00 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)

CPC C07F 5/00 (2013.01) [C23C 16/34 (2013.01); C23C 16/407 (2013.01); C23C 16/45525 (2013.01)]

9 Claims

1. A compound represented by the following general formula (1), or compound No. 224:

where R¹to R⁴each independently represent an alkyl group having 1 to 5 carbon atoms, or a group represented by the following general formula (X−1), (X−2), or (X−3), R⁵and R⁶each independently represent an alkyl group having 1 to 5 carbon atoms, M¹represents a gallium atom or an indium atom, and part or all of hydrogen atoms in the alkyl group having 1 to 5 carbon atoms represented by each of R¹to R⁶may each be substituted with a fluorine atom;

where R²¹to R²³each independently represent an alkyl group having 1 to 5 carbon atoms, and * represents a bonding site;