| CPC C02F 1/442 (2013.01) [B01D 69/12 (2013.01); B01D 71/0211 (2022.08); B01D 71/0212 (2022.08); B01D 71/30 (2013.01); C02F 1/441 (2013.01); C02F 1/4693 (2013.01); C02F 2101/163 (2013.01)] | 13 Claims |
|
1. A plasma activated system for producing nitrates, nitrites and hydrogen peroxide, comprising:
a plasma reactor, comprising:
a tubular reactor body portion having one or more internal walls that define an internal cavity;
at least one electrically-conductive inlet capillary having an inlet capillary body extending between a fluid-receiving tip and a fluid-injecting tip, wherein the fluid-receiving tip is positioned outside the internal cavity, and wherein the fluid-injecting tip is positioned inside the internal cavity;
at least one electrically-conductive outlet capillary having an outlet capillary body extending between a fluid-collecting tip and a fluid-ejecting tip, wherein the fluid-collecting tip is positioned inside the internal cavity, and wherein the fluid-ejecting tip is positioned outside the internal cavity, the inlet capillary being aligned with the outlet capillary;
a mixing chamber outside of the tubular reactor body having a nitrogen-containing feed gas inlet, a liquid water inlet, and a mixed nitrogen-containing gas and water outlet, the mixed nitrogen-containing gas and water outlet being in fluid communication with the fluid-receiving tip of the electrically conductive inlet capillary;
a power source supplying a voltage across the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary;
wherein the fluid injecting tip is disposed relative to the fluid collecting tip to generate a flowing liquid water film region on the one or more internal walls and a gas stream comprising nitrogen-containing gas flowing through the flowing liquid water film region, when mixed nitrogen-containing gas and water from the mixing chamber is injected into the internal cavity via the at least one electrically conductive inlet capillary;
wherein the fluid injecting tip is disposed relative to the fluid collecting tip to propagate a plasma discharge along the flowing liquid film region between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary to create a plasma activated water flow and a flowing gas stream comprising nitrogen-containing gas and plasma; and,
a membrane reactor-concentrator comprising a plasma activated water flow channel with a plasma activated water inlet and a plasma activated water outlet, a dry gas inlet and a humidified gas outlet, the plasma activated water flow channel comprising an ion selective membrane, the membrane reactor-concentrator receiving the plasma activated water flow and the nitrogen-containing gas stream from the plasma reactor, the membrane reactor-concentrator further comprising a recycle conduit for recycling gas and water vapor from the humidified gas outlet of the membrane reactor-concentrator to the nitrogen-containing feed gas inlet of the plasma reactor, and a control valve for controlling the flow of recycling gas and water vapor through the recycle conduit; and,
whereby the plasma activated water will contact the ion selective membrane, water will pass through the membrane into the dry gas, and the plasma activated water in the plasma activated water flow channel will continue to react with the flowing air and plasma gas stream, and the plasma activated water leaving the membrane reactor-concentrator will have increased concentrations and additional molecules of nitrates, nitrites and hydrogen peroxide relative to those leaving the plasma reactor.
|