US 12,291,458 B2
Method for removing an impurity from a chlorosilane mixture
Jens Felix Knoth, Marktl (DE); Sebastian Bochmann, Zschorlau OT Albernau (DE); Uwe Pätzold, Burghausen (DE); and Sebastian Prost, Kirchdorf (DE)
Assigned to WACKER CHEMIE AG, Munich (DE)
Appl. No. 17/778,236
Filed by WACKER CHEMIE AG, Munich (DE)
PCT Filed Nov. 27, 2019, PCT No. PCT/EP2019/082727
§ 371(c)(1), (2) Date May 19, 2022,
PCT Pub. No. WO2021/104618, PCT Pub. Date Jun. 3, 2021.
Prior Publication US 2022/0411273 A1, Dec. 29, 2022
Int. Cl. C01B 33/107 (2006.01); B01J 20/28 (2006.01); B01J 20/285 (2006.01); C07F 7/12 (2006.01); C07F 7/20 (2006.01)
CPC C01B 33/10794 (2013.01) [B01J 20/285 (2013.01); C01B 33/1071 (2013.01); C07F 7/12 (2013.01); C07F 7/20 (2013.01); B01J 20/28016 (2013.01); B01J 20/28061 (2013.01); B01J 20/28083 (2013.01)] 20 Claims
 
1. A process for at least partially removing an impurity from a liquid mixture comprising at least one chlorosilane and/or organochlorosilane and at least one impurity which is a boron compound, a phosphorus compound, an arsenic compound, or an antimony compound, comprising the steps of:
a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of structural formula (I),

OG Complex Work Unit Chemistry
where
CAR=carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; and
b) optionally removing the functionalized carrier material.