US 11,973,167 B2
Photoresist patterning process supporting two step phosphor-deposition to form an LED matrix array
Daniel Bernardo Roitman, Menlo Park, CA (US); Emma Dohner, Redwood City, CA (US); Kentaro Shimizu, Sunnyvale, CA (US); and Marcel Rene Bohmer, Eindhoven (NL)
Assigned to Lumileds LLC, San Jose, CA (US)
Filed by LUMILEDS LLC, San Jose, CA (US)
Filed on Dec. 10, 2021, as Appl. No. 17/548,175.
Application 17/548,175 is a continuation of application No. 16/715,930, filed on Dec. 16, 2019, granted, now 11,201,267.
Claims priority of provisional application 62/783,970, filed on Dec. 21, 2018.
Claims priority of application No. 19156331 (EP), filed on Feb. 11, 2019.
Prior Publication US 2022/0102595 A1, Mar. 31, 2022
Int. Cl. H01L 33/50 (2010.01); H01L 33/00 (2010.01); H01L 33/60 (2010.01)
CPC H01L 33/502 (2013.01) [H01L 33/005 (2013.01); H01L 33/505 (2013.01); H01L 33/60 (2013.01); H01L 2933/0041 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A phosphor structure comprising:
a plurality of phosphor pixels spaced apart from each other, each of the phosphor pixels comprising side walls facing adjacent phosphor pixels, and a top surface and a bottom surface having at least one of the side walls in between them; and
a reflective structure disposed between the side walls of adjacent phosphor pixels, and disposed at alternating top surfaces and bottom surfaces of adjacent phosphor pixels.