US 11,972,948 B2
Adhesion layers for EUV lithography
Andrea M. Chacko, Rolla, MO (US); Vandana Krishnamurthy, Rolla, MO (US); Yichen Liang, Rolla, MO (US); Hao Lee, Camas, WA (US); Stephen Grannemann, Rolla, MO (US); and Douglas J. Guerrero, Tombeek (BE)
Assigned to Brewer Science, Inc., Rolla, MO (US)
Filed by Brewer Science, Inc., Rolla, MO (US)
Filed on Jun. 12, 2019, as Appl. No. 16/439,377.
Claims priority of provisional application 62/684,359, filed on Jun. 13, 2018.
Prior Publication US 2019/0385837 A1, Dec. 19, 2019
Int. Cl. G03F 7/00 (2006.01); G03F 1/24 (2012.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01)
CPC H01L 21/0274 (2013.01) [G03F 1/24 (2013.01); G03F 7/70033 (2013.01); H01L 21/02115 (2013.01); H01L 21/02282 (2013.01); H01L 21/02304 (2013.01); H01L 21/02422 (2013.01)] 29 Claims
 
1. A method of forming a structure, said method comprising:
providing a substrate, said substrate including one or more intermediate layers thereon, said one or more intermediate layers comprising:
a spin-on carbon layer;
a hardmask layer comprising one or more of a silane, siloxane, silsesquioxane, silicon oxynitride, silicon nitride, polysilicon, or amorphous silicon; or
both said spin-on carbon layer and said hardmask layer on said spin-on carbon layer;
spin coating a composition on said spin-on carbon layer or on said hardmask layer to form an adhesion layer having an average thickness that is greater than a monolayer but less than 9 nm and a metal content of less than about 0.001% by weight, based upon the total weight of the adhesion layer taken as 100% by weight, wherein said composition comprises a component chosen from:
styrenes;
epoxies;
novolacs;
cyanurates;
polymers comprising recurring monomers selected from the group consisting of vinylic monomers, vinylic monomers grafted with a moiety, acrylic monomers, and combinations thereof;
or combinations of the forgoing, wherein:
said vinylic monomers are selected from the group consisting of glycidyl acrylate, glycidyl methacrylate, and combinations thereof;
said vinylic monomers grafted with a moiety are selected from the group consisting of chromophores with carboxylic acid moieties, alkyl carboxylic acids, aromatic carboxylic acids, ethers with carboxylic acid moieties, and combinations of the foregoing; and
said acrylic monomers are selected from the group consisting of 2-hydroxy-3-phenoxypropyl acrylate, hydroxy propyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, tert-butyl methacrylate, and combinations thereof;
forming a photoresist layer comprising a metal on said adhesion layer; and
subjecting at least a portion of said photoresist layer to EUV radiation.