US 11,972,548 B2
Computer-implemented method for defect analysis, apparatus for defect analysis, computer-program product, and intelligent defect analysis system
Haijin Wang, Beijing (CN); and Jianfeng Zeng, Beijing (CN)
Assigned to BOE Technology Group Co., Ltd., Beijing (CN)
Appl. No. 17/438,734
Filed by BOE Technology Group Co., Ltd., Beijing (CN)
PCT Filed Dec. 3, 2020, PCT No. PCT/CN2020/133683
§ 371(c)(1), (2) Date Sep. 13, 2021,
PCT Pub. No. WO2022/116109, PCT Pub. Date Jun. 9, 2022.
Prior Publication US 2022/0405909 A1, Dec. 22, 2022
Int. Cl. G06F 18/2113 (2023.01); G06T 7/00 (2017.01); G06T 7/50 (2017.01); G06V 10/44 (2022.01); G06V 10/762 (2022.01); G06V 10/771 (2022.01); G06V 10/80 (2022.01)
CPC G06T 7/0002 (2013.01) [G06T 7/50 (2017.01); G06V 10/7625 (2022.01); G06V 10/80 (2022.01)] 17 Claims
OG exemplary drawing
 
1. A computer-implemented method for defect analysis, comprising:
obtaining a plurality of sets of defect point coordinates, a respective set of the plurality of sets of defect point coordinates comprising coordinates of defect points in a respective substrate of a plurality of substrates, the coordinates of defect points in the respective substrate being coordinates in an image coordinate system;
combining the plurality of sets of defect point coordinates according to the image coordinate system into a composite set of coordinates to generate a composite image;
performing a clustering analysis to classify defect points in the composite set in the composite image into a plurality of clusters
determining a plurality of contours respectively of at least a plurality of selected clusters of the plurality of clusters, a respective one of the plurality of contours comprising a plurality of edge defect points in a respective one of the plurality of selected clusters;
applying a fitting algorithm to edge defect points of the plurality of selected clusters to generate a plurality of mask areas respectively corresponding to the plurality of selected clusters; and
generating a plurality of feature vectors respectively of the plurality of mask areas.