US 11,972,194 B2
Method for determining patterning device pattern based on manufacturability
Roshni Biswas, San Jose, CA (US); Rafael C. Howell, Santa Clara, CA (US); Cuiping Zhang, Fremont, CA (US); Ningning Jia, Shenzhen (CN); Jingjing Liu, San Jose, CA (US); and Quan Zhang, San Jose, CA (US)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Dec. 28, 2022, as Appl. No. 18/089,848.
Application 18/089,848 is a continuation of application No. 17/297,801, granted, now 11,580,289, previously published as PCT/EP2019/079562, filed on Oct. 29, 2019.
Claims priority of provisional application 62/773,475, filed on Nov. 30, 2018.
Prior Publication US 2023/0141799 A1, May 11, 2023
Int. Cl. G06F 30/30 (2020.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 119/18 (2020.01)
CPC G06F 30/398 (2020.01) [G03F 7/70441 (2013.01); G03F 7/705 (2013.01); G03F 7/70625 (2013.01); G06F 30/392 (2020.01); G06F 2119/18 (2020.01)] 20 Claims
OG exemplary drawing
 
1. A method for determining a patterning device pattern, the method comprising:
obtaining an initial patterning device pattern having at least one feature;
applying a blob detection to the initial patterning device pattern; and
determining, using a cost function based on a result of the blob detection, the patterning device pattern.