US 11,971,307 B2
Device and method for measuring wavelength for laser device
Guangyi Liu, Beijing (CN); Rui Jiang, Beijing (CN); Xiaoquan Han, Beijing (CN); Jiangshan Zhao, Beijing (CN); Pengfei Sha, Beijing (CN); Qingqing Yin, Beijing (CN); and Hua Zhang, Beijing (CN)
Assigned to Beijing RSLaserOpto-Electronics Technology Co. Ltd, Beijing (CN)
Appl. No. 17/915,434
Filed by Beijing RSLaser Opto-Electronics Technology Co., Ltd., Beijing (CN)
PCT Filed Dec. 11, 2020, PCT No. PCT/CN2020/135615
§ 371(c)(1), (2) Date Sep. 28, 2022,
PCT Pub. No. WO2021/196723, PCT Pub. Date Oct. 7, 2021.
Claims priority of application No. 202010244216.8 (CN), filed on Mar. 31, 2020.
Prior Publication US 2023/0144290 A1, May 11, 2023
Int. Cl. G01J 9/02 (2006.01)
CPC G01J 9/0246 (2013.01) [G01J 2009/0234 (2013.01); G01J 2009/0257 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A device for measuring a wavelength for a laser device, comprising:
a first optical path assembly configured to homogenize a laser beam emitted by the laser device; and
a second optical path assembly constituting a laser wavelength measurement optical path with the first optical path assembly, and configured to perform a hierarchical imaging on the laser beam homogenized by the first optical path assembly;
wherein the second optical path assembly comprises:
an FP etalon assembly comprising at least two FP etalons, the homogenized laser beam passing through the FP etalon assembly to generate an interference fringe; and
an optical classifier arranged after the FP etalon assembly in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly, so as to achieve the hierarchical imaging.