US 12,289,963 B2
Display device and method of manufacturing the same
Gwuihyun Park, Yongin-si (KR); Pilsoon Hong, Buchen-si (KR); Hyein Kim, Yongin-si (KR); Chulwon Park, Yongin-si (KR); Koichi Sugitani, Yongin-si (KR); and Hyungbin Cho, Yongin-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed on Mar. 28, 2023, as Appl. No. 18/127,390.
Application 18/127,390 is a division of application No. 16/992,690, filed on Aug. 13, 2020, granted, now 11,637,158.
Claims priority of application No. 10-2019-0148088 (KR), filed on Nov. 18, 2019.
Prior Publication US 2023/0240099 A1, Jul. 27, 2023
Int. Cl. H10K 59/122 (2023.01); H10K 59/12 (2023.01); H10K 59/124 (2023.01)
CPC H10K 59/122 (2023.02) [H10K 59/124 (2023.02); H10K 59/1201 (2023.02)] 9 Claims
OG exemplary drawing
 
1. A method of manufacturing a display device, the method comprising:
forming a substrate, the substrate including a first base layer, a first barrier layer, a second base layer, and a second barrier layer, which are sequentially stacked one on another;
forming a first groove by either removing portions of the second base layer and the second barrier layer, or removing a portion of the second barrier layer;
filling the first groove with a first siloxane layer comprising siloxane;
forming a plurality of display elements arranged over the substrate and not overlapping the first groove;
forming a pixel circuit layer between the substrate and the display elements and including a pixel circuit and an insulation layer;
forming a second groove by removing a portion of the insulation layer of the pixel circuit layer to expose an upper surface of the first siloxane layer;
filling the second groove with a second siloxane layer comprising siloxane;
forming a third siloxane layer comprising siloxane on the second siloxane layer; and
disposing a component below the substrate to overlap the first groove and the second groove,
wherein
the first and second base layers include a polymer resin and the first and second barrier layers include an inorganic material.