US 12,288,021 B2
Apparatus and method for generating a parameterized waveguide optical elements
Feng-Wei Kuo, Zhudong Township, Hsinchu County (TW); and Wen-Shiang Liao, Miaoli County (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu (TW)
Filed on Feb. 16, 2024, as Appl. No. 18/444,142.
Application 18/444,142 is a continuation of application No. 17/162,912, filed on Jan. 29, 2021, granted, now 11,928,413.
Prior Publication US 2024/0232499 A1, Jul. 11, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 30/392 (2020.01); G02B 27/00 (2006.01); G05B 19/18 (2006.01); G06F 30/39 (2020.01); G06F 30/394 (2020.01); G06F 30/398 (2020.01); G02B 6/122 (2006.01); G02B 6/124 (2006.01)
CPC G06F 30/392 (2020.01) [G02B 27/0012 (2013.01); G05B 19/188 (2013.01); G06F 30/39 (2020.01); G06F 30/394 (2020.01); G06F 30/398 (2020.01); G02B 6/1228 (2013.01); G02B 6/124 (2013.01); G05B 2219/45026 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for generating a physical layout for a grating coupler integrated in a photonically-enabled circuit comprising:
receiving a photonically-enabled integrated circuit design;
receiving a parametrized wavelength of an optical beam, a parametrized first refractive index of the grating coupler, and a parametrized second refractive index of a cladding layer;
receiving a parametrized taper length of the grating coupler;
generating a connection routing layout for the grating coupler placed on a semiconductor substrate;
generating a physical layout for the grating coupler based at least on the received parametrized wavelength, the parametrized first refractive index, the parametrized second refractive index, and the parametrized taper length; and
outputting the physical layout of the grating coupler for manufacturing under a semiconductor fabrication process.