US 12,287,587 B2
Damping arrangement for vibration damping of an element in an optical system
Marwene Nefzi, Ulm (DE); Stefan Hembacher, Bobingen (DE); David Schoenen, Aalen (DE); and Jens Kugler, Aalen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Nov. 8, 2022, as Appl. No. 17/983,070.
Application 17/983,070 is a continuation of application No. PCT/EP2021/054038, filed on Feb. 18, 2021.
Claims priority of application No. 102020206589.6 (DE), filed on May 27, 2020.
Prior Publication US 2023/0104921 A1, Apr. 6, 2023
Int. Cl. G03F 7/00 (2006.01); F16F 7/10 (2006.01); G02B 7/182 (2021.01)
CPC G03F 7/709 (2013.01) [F16F 7/1034 (2013.01); G02B 7/182 (2013.01); F16F 2222/08 (2013.01); F16F 2228/066 (2013.01); F16F 2230/00 (2013.01)] 22 Claims
OG exemplary drawing
 
15. A system, comprising:
an optical element comprising a cavity;
a fluid located in the cavity of the optical element; and
a second element different from the optical element, the second element being spaced apart from the optical element, the second element comprising an interior, the interior of the second element defining a channel connected to the cavity of the optical element,
wherein:
the damping arrangement is configured so that a vibration of the optical element causes vibration energy of the optical element to be dissipated by partial displacement of the fluid from the cavity of the optical element into the channel of the second element; and
the system is a microlithographic projection exposure apparatus.