US 12,287,586 B2
Stage system, lithographic apparatus, method for positioning and device manufacturing method
Stef Marten Johan Janssens, Eindhoven (NL); Bert Dirk Scholten, Best (NL); Sjoerd Nicolaas Lambertus Donders, Vught (NL); Teunis Van Dam, Eindhoven (NL); Peter Mark Overschie, Eindhoven (NL); Theresa Mary Spaan-Burke, Eindhoven (NL); and Siegfried Alexander Tromp, Knegsel (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Dec. 28, 2023, as Appl. No. 18/398,860.
Application 18/398,860 is a continuation of application No. 16/309,501, granted, now 11,860,552, previously published as PCT/EP2017/064265, filed on Jun. 12, 2017.
Claims priority of application No. 16177447 (EP), filed on Jul. 1, 2016; and application No. 17158730 (EP), filed on Mar. 1, 2017.
Prior Publication US 2024/0168394 A1, May 23, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01)
CPC G03F 7/70725 (2013.01) [G03F 7/707 (2013.01); G03F 7/70783 (2013.01); G03F 7/70816 (2013.01); H01L 21/6838 (2013.01); H01L 21/67288 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An object table adapted to support an object to be positioned, the object table comprising:
a clamping device to clamp the object;
a plurality of burls configured to provide a support surface for the object; and
a plurality of gas bearing devices arranged to support the object prior to clamping of the object on the burls, wherein each gas bearing device is in fluid communication with a source of sub-atmospheric pressure configured to pull the object towards the surface and a source of pressurized gas configured to push the object away from the surface such that a balance between the pushing force that the pressurized gas exerts on the object and the pulling force that the sub-atmospheric pressure exerts on the object allows the object to be positioned in a direction perpendicular to the surface.