US 12,287,583 B2
Method for modeling measurement data over a substrate area and associated apparatuses
Edo Maria Hulsebos, Bergeijk (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/001,869
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed May 18, 2021, PCT No. PCT/EP2021/063147
§ 371(c)(1), (2) Date Dec. 14, 2022,
PCT Pub. No. WO2021/254709, PCT Pub. Date Dec. 23, 2021.
Claims priority of application No. 20180323 (EP), filed on Jun. 16, 2020.
Prior Publication US 2023/0221655 A1, Jul. 13, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70525 (2013.01) [G03F 7/705 (2013.01); G03F 9/7003 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A method for modeling measurement data over a substrate area relating to a substrate in a lithographic process, comprising:
obtaining measurement data relating to a first layout;
fitting a first model to the first layout, wherein the first model comprises an oblique subspace model or a generalized least squares model; and
performing a model mapping operation on the first model.