US 12,287,582 B2
Method for controlling a lithographic apparatus and associated apparatuses
Frank Staals, Eindhoven (NL); and Simon Hendrik Celine Van Gorp, Oud-Turnhout (BE)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/437,884
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Feb. 17, 2020, PCT No. PCT/EP2020/054073
§ 371(c)(1), (2) Date Sep. 10, 2021,
PCT Pub. No. WO2020/193010, PCT Pub. Date Oct. 1, 2020.
Claims priority of application No. 19164702 (EP), filed on Mar. 22, 2019; and application No. 19185785 (EP), filed on Jul. 11, 2019.
Prior Publication US 2022/0146946 A1, May 12, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70525 (2013.01) [G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70725 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for configuring an apparatus for providing structures to a layer on a substrate, the method comprising:
obtaining first data comprising substrate specific data as measured and/or modeled before the providing of the structures to the layer on the substrate; and
determining, by a hardware computer system, a configuration of the apparatus for at least two different control regimes based on the first data and the use of a common merit function comprising parameters associated with the at least two control regimes; and
providing the configuration to the apparatus for control of the providing structures to a layer on a substrate.