US 12,287,580 B2
Fluid handling system, method and lithographic apparatus
Cornelius Maria Rops, Waalre (NL); Christianus Wilhelmus Johannes Berendsen, Eindhoven (NL); Erik Henricus Egidius Catharina Eummelen, Veldhoven (NL); and Dagmar Antoinette Wismeijer, Zeist (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 18/015,522
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jun. 14, 2021, PCT No. PCT/EP2021/065976
§ 371(c)(1), (2) Date Jan. 10, 2023,
PCT Pub. No. WO2022/012830, PCT Pub. Date Jan. 20, 2022.
Claims priority of application No. 20185608 (EP), filed on Jul. 14, 2020.
Prior Publication US 2023/0259037 A1, Aug. 17, 2023
Int. Cl. B06B 1/06 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70341 (2013.01) [B06B 1/0644 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A lithographic apparatus comprising:
a substrate holder configured to hold a substrate,
a projection system configured to project a radiation beam onto the substrate held by the substrate holder,
a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid, and
an excitation device configured to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.