US 12,287,567 B2
Method and system for reticle enhancement technology
Akira Fujimura, Saratoga, CA (US); Nagesh Shirali, San Jose, CA (US); and Ajay Baranwal, Dublin, CA (US)
Assigned to D2S, Inc., San Jose, CA (US)
Filed by D2S, Inc., San Jose, CA (US)
Filed on Jan. 30, 2024, as Appl. No. 18/427,577.
Application 18/427,577 is a continuation of application No. 18/157,425, filed on Jan. 20, 2023, granted, now 11,921,420.
Claims priority of provisional application 63/267,249, filed on Jan. 28, 2022.
Prior Publication US 2024/0201577 A1, Jun. 20, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 1/36 (2012.01); G03F 1/22 (2012.01)
CPC G03F 1/36 (2013.01) [G03F 1/22 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A method for reticle enhancement technology (RET) for transferring a pattern to a substrate, the method comprising:
inputting a mask exposure information;
determining a mask 3D (M3D) effect, wherein the determining the M3D effect includes determining a variable side wall angle (VSA);
calculating a calculated pattern on the substrate using the M3D effect; and
modifying the mask exposure information based on the calculated pattern on the substrate.