| CPC F17C 1/14 (2013.01) [C23C 14/246 (2013.01); C23C 16/45544 (2013.01); C23C 16/45561 (2013.01); F17C 1/005 (2013.01)] | 11 Claims |
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1. A deposition system, comprising:
a process chamber;
a gas supply outside of the process chamber, the gas supply being configured to provide gaseous monochlorosilane; and
a gas supply pipe connecting the gas supply to the process chamber,
wherein the gas supply includes:
a cabinet, and
a gas container inside the cabinet, the gas container containing the gaseous monochlorosilane,
wherein the gas container includes aluminum (Al),
wherein a ratio of an amount of monochlorosilane to an internal volume of the gas container is 0.7 kg/L to 0.8 kg/L,
wherein the gas container comprises:
an external container,
a first aluminum oxide layer on an internal surface of the external container, and
a first passivation layer comprising monochlorosilane on an internal surface of the first aluminum oxide layer, the first passivation layer formed by rolling the gas container after monochlorosilane is provided in the gas container, and
wherein the gas supply pipe includes:
an aluminum layer,
a second aluminum oxide layer covering an internal surface of the aluminum layer, and
a second passivation layer comprising monochlorosilane on an internal surface of the second aluminum oxide layer.
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