CPC C25D 3/665 (2013.01) [C25D 3/54 (2013.01); C25D 5/011 (2020.08); C25D 5/10 (2013.01); C25D 5/50 (2013.01); C25D 7/12 (2013.01); H01L 31/022425 (2013.01); H01L 31/022458 (2013.01); H01L 31/028 (2013.01); H01L 31/068 (2013.01); H01L 31/0682 (2013.01); H01L 31/1804 (2013.01)] | 19 Claims |
1. A method for processing a silicon solar cell, the method comprising:
preparing an ionic liquid comprising aluminum chloride (AlCl3) and an organic halide;
patterning a partially-processed silicon solar cell to expose an n-type surface of a silicon substrate;
bringing the n-type surface of the silicon substrate of the partially processed silicon solar cell into contact with the ionic liquid, wherein the n-type surface does not comprise a seed layer;
illuminating the n-type surface, wherein the illumination passes through the ionic liquid, wherein the illumination is generated at least partially by a light source comprising at least one light-emitting diode, and wherein a photo-generated current is generated by the illumination;
while illuminating the silicon substrate with the light source, applying a current between an anode and a cathode to generate an applied current, wherein the applied current generates a current density of between 30 milliamps per centimeter squared (mA/cm2) and 50 mA/cm2; and
depositing aluminum onto the silicon substrate via a light-induced electroplating process, wherein the light-induced electroplating process utilizes the applied current that does not exceed the photo-generated current generated by the illumination.
|