US 12,286,710 B2
Methods of low-temperature/BEOL-compatible highly scalable graphene synthesis
Kaustav Banerjee, Goleta, CA (US); Ravi Iyengar, Milpitas, CA (US); Satish Sundar, San Jose, CA (US); and Nalin Rupesinghe, Cambridge (GB)
Assigned to Destination 2D Inc., Milpitas, CA (US)
Filed by Destination 2D Inc., Milpitas, CA (US)
Filed on Jun. 9, 2023, as Appl. No. 18/208,232.
Application 18/208,232 is a division of application No. 17/857,954, filed on Jul. 5, 2022, granted, now 11,976,369.
Claims priority of provisional application 63/218,498, filed on Jul. 6, 2021.
Prior Publication US 2023/0313358 A1, Oct. 5, 2023
Int. Cl. C23C 16/46 (2006.01); C23C 8/64 (2006.01)
CPC C23C 8/64 (2013.01) 7 Claims
OG exemplary drawing
 
1. A method for migration of a deposition material across a diffusion couple deposited on a substrate to a substrate surface comprising:
using a reactor system to facilitate the migration of one or more diffusion materials across a diffusion couple to a substrate by
applying a specified pressure to facilitate the migration of the one or more diffusion materials across the diffusion couple to the substrate, wherein the specified pressure has a value between 14.5 psi and 125 psi; and
applying a temperature to facilitate the migration of the one or more diffusion materials across a diffusion couple to the substrate, wherein a heatable top disk is controlled at a temperature between 25° C. and 500° C. and a heatable bottom disk is controlled at a temperature between 25° C. and 500°° C., and wherein graphene is formed on the substrate surface.