US 12,286,695 B2
Fe-based nanocrystalline alloy and electronic component using the same
Sang Kyun Kwon, Suwon-si (KR); Chang Ryul Jung, Suwon-si (KR); Jong Ho Chung, Suwon-si (KR); and Jung Young Cho, Suwon-si (KR)
Assigned to Samsung Electro-Mechanics Co., Ltd., Suwon-si (KR)
Filed by SAMSUNG ELECTRO-MECHANICS CO., LTD., Suwon-si (KR)
Filed on Nov. 10, 2017, as Appl. No. 15/808,952.
Claims priority of application No. 10-2016-0171776 (KR), filed on Dec. 15, 2016; and application No. 10-2017-0031341 (KR), filed on Mar. 13, 2017.
Prior Publication US 2018/0171444 A1, Jun. 21, 2018
Int. Cl. H01F 1/153 (2006.01); C21D 6/00 (2006.01); C22C 38/02 (2006.01); C22C 38/12 (2006.01); C22C 38/16 (2006.01); H01F 1/147 (2006.01); H01F 27/245 (2006.01); H01F 27/36 (2006.01); H01F 38/14 (2006.01)
CPC C22C 38/16 (2013.01) [C21D 6/008 (2013.01); C22C 38/02 (2013.01); C22C 38/12 (2013.01); H01F 1/14775 (2013.01); H01F 1/15308 (2013.01); H01F 1/15333 (2013.01); H01F 27/245 (2013.01); H01F 27/36 (2013.01); H01F 27/366 (2020.08); H01F 38/14 (2013.01); C22C 2200/04 (2013.01); C22C 2202/02 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An Fe-based nanocrystalline alloy represented by FexBySizMαAβ, wherein:
M is one or more elements selected from the group consisting of Nb, V, W, Ta, Zr, Hf, Ti, and Mo;
A is one or more elements selected from the group consisting of Cu and Au;
x, y, z, α, and β respectively satisfy, based on atom %, 75%≤x≤81%, 7%≤y≤13%, 4%≤z≤12%, 1.5%≤α≤3% and 0.1%≤β≤1.5%;
a differential scanning calorimetry (DSC) graph of the Fe-based nanocrystalline alloy between 470° C. and 620° C. comprises a first contour with a crystallization temperature range having an onset crystallization temperature, and between 640° C. and 720° C. a second contour narrower than the first contour;
a maximum heat amount of the first contour and a maximum heat amount of the second contour are within 0.5 W/q of each other;
a global maximum and a local maximum, which is different from the global maximum, of the first contour are both greater than a local maximum of the second contour; and
wherein the second contour comprises a global minimum, the local maximum, and a local minimum in this order.