US 12,284,745 B2
Extreme ultraviolet light generation method, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
Yoshiyuki Honda, Oyama (JP); Hirokazu Hosoda, Oyama (JP); and Kouichiro Kouge, Oyama (JP)
Assigned to Gigaphoton Inc., Tochigi (JP)
Filed by Gigaphoton Inc., Tochigi (JP)
Filed on Aug. 29, 2022, as Appl. No. 17/823,049.
Claims priority of application No. 2021-174093 (JP), filed on Oct. 25, 2021.
Prior Publication US 2023/0126340 A1, Apr. 27, 2023
Int. Cl. H05G 2/00 (2006.01)
CPC H05G 2/008 (2013.01) [H05G 2/006 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An extreme ultraviolet light generation method, comprising:
a target supply step of outputting a droplet target into a chamber;
a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target; and
a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light,
the main pulse laser light including first main pulse laser light and second main pulse laser light, and
in the main pulse laser light irradiation step, the diffusion target being irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.