US 12,283,940 B2
Vibration device
Masahiro Fujii, Shiojiri (JP); and Ryuichi Kurosawa, Hara (JP)
Assigned to SEIKO EPSON CORPORATION, (JP)
Filed by Seiko Epson Corporation, Tokyo (JP)
Filed on Oct. 20, 2021, as Appl. No. 17/505,713.
Claims priority of application No. 2020-176623 (JP), filed on Oct. 21, 2020.
Prior Publication US 2022/0123716 A1, Apr. 21, 2022
Int. Cl. H03H 9/10 (2006.01); H03H 3/02 (2006.01); H03H 9/19 (2006.01)
CPC H03H 9/1021 (2013.01) [H03H 3/02 (2013.01); H03H 9/19 (2013.01); H03H 2003/022 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A vibration device comprising:
a semiconductor substrate having a first surface at which an integrated circuit is provided and a second surface that is a rear surface with respect to the first surface, which is a front surface;
a vibration element disposed at the first surface;
a lid having a recess that opens toward the first surface and a contact surface that is in contact with the first surface in such a way that the vibration element is accommodated in the recess, the lid being bonded to the first surface via the contact surface; and
a metal layer disposed between the first surface and the contact surface, wherein
at least part of the integrated circuit overlaps with the metal layer in a plan view viewed in a direction of a normal to the first surface
a third metal layer that is electrically continuous with the metal layer is provided at a bottom surface of the recess of the lid, and
the lid is formed of a silicon substrate, the third metal layer has a thickness smaller than or equal to 20 nm, and infrared light can pass through the lid and the third metal laver.