| CPC H01L 21/6715 (2013.01) [B05D 1/005 (2013.01); G03F 7/162 (2013.01); H01L 21/02282 (2013.01); H01L 21/02365 (2013.01)] | 17 Claims |

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1. A method of coating a substrate, the method comprising:
supporting the substrate in a horizontal orientation;
positioning a shield member at a first distance from the substrate;
dispensing a coating material onto a first surface of the substrate;
moving the shield member towards the first surface of the substrate until the shield member is positioned a second distance from the substrate, the second distance being less than the first distance;
flowing a solvent vapor through a central chamber of the shield member to create a solvent rich ambient around the substrate;
rotating the substrate about a rotational axis to form a film of the coating material on the first surface of the substrate;
flowing a gas through a peripheral chamber of the shield member that at least partially surrounds the central chamber of the shield member, the gas exiting the peripheral chamber flowing towards the first surface of the substrate in a direction away from the rotational axis;
wherein the substrate is supported and rotated by a chuck, and further comprising flowing the gas through openings in a bottom surface of the chuck into a space between a second surface of the substrate and a floor of the chuck to prevent aerosols of the coating material from being deposited on the second surface of the substrate; and
wherein the first surface of the substrate is a back side of the substrate, wherein no vacuum is applied onto the substrate during the holding and rotating of the substrate, and wherein the rotational axis of the substrate is offset from a center of rotation of the chuck.
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