US 12,283,498 B2
Light irradiation type heat treatment apparatus
Akitsugu Ueda, Kyoto (JP); Hiroshi Miyake, Kyoto (JP); Kazuhiko Fuse, Kyoto (JP); and Hideaki Tanimura, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Sep. 2, 2021, as Appl. No. 17/465,038.
Claims priority of application No. 2020-151226 (JP), filed on Sep. 9, 2020.
Prior Publication US 2022/0076970 A1, Mar. 10, 2022
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/67115 (2013.01) 2 Claims
OG exemplary drawing
 
1. A heat treatment apparatus for heating a substrate by irradiating the substrate with light, comprising:
a chamber for receiving a substrate therein;
a holder for holding said substrate in said chamber;
a light irradiation part provided over said chamber and for irradiating said substrate held by said holder with light;
a quartz window provided in an upper portion of said chamber and for transmitting light emitted from said light irradiation part therethrough into said chamber;
a light diffusion plate placed on an upper surface of said quartz window and for diffusing the light emitted from said light irradiation part; and
an air escape mechanism for allowing air remaining on contact surfaces of said quartz window and said light diffusion plate to escape, said air escape mechanism being provided in said quartz window or in said light diffusion plate,
wherein said air escape mechanism is a through hole extending through said light diffusion plate between upper and lower surfaces thereof.