US 12,283,467 B2
Plasma strip tool with movable insert
Maolin Long, Santa Clara, CA (US); and Qiqun Zhang, Palo Alto, CA (US)
Assigned to Beijing E-Town Semiconductor Technology Co., Ltd., Beijing (CN); and Mattson Technology, Inc., Fremont, CA (US)
Filed by Beijing E-Town Semiconductor Technology Co., Ltd., Beijing (CN); and Mattson Technology, Inc., Fremont, CA (US)
Filed on Aug. 27, 2021, as Appl. No. 17/458,807.
Claims priority of provisional application 63/071,418, filed on Aug. 28, 2020.
Prior Publication US 2022/0068611 A1, Mar. 3, 2022
Int. Cl. H01J 37/32 (2006.01); B08B 7/00 (2006.01); H01L 21/263 (2006.01)
CPC H01J 37/32623 (2013.01) [B08B 7/0035 (2013.01); H01J 37/321 (2013.01); H01J 37/32422 (2013.01); H01L 21/263 (2013.01); H01J 2237/3342 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A plasma processing apparatus for processing a workpiece, the plasma processing apparatus comprising:
a processing chamber;
a plasma chamber separated from the processing chamber;
an inductively coupled plasma source configured to generate a plasma in the plasma chamber;
a pedestal disposed within the processing chamber, the pedestal configured to support a workpiece;
an insert disposed in the plasma chamber, wherein the insert is a tubular insert having a first closed end and a second open end, the first closed end is disposed within the plasma chamber and the second open end is open to atmosphere, wherein the insert is configured to be movable to one or more vertical positions within the plasma chamber, and
a control system communicatively coupled to the insert to move the insert to one or more vertical positions within the plasma chamber.