US 12,283,460 B2
Closed loop faraday correction of a horizontal beam current profile for uniform current tuning
Tyler Wills, Marblehead, MA (US); and Richard Allen Sprenkle, South Hamilton, MA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 29, 2022, as Appl. No. 17/897,719.
Prior Publication US 2024/0071719 A1, Feb. 29, 2024
Int. Cl. H01J 37/317 (2006.01); H01J 37/304 (2006.01)
CPC H01J 37/3171 (2013.01) [H01J 37/304 (2013.01); H01J 2237/24405 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/30483 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An ion implantation system, comprising:
an ion source from which a spot beam is extracted;
a scanner which scans the spot beam in a first direction to create diverging ion trajectory paths;
an angle corrector to alter the diverging ion trajectory paths into substantially parallel paths of a scanned ion beam;
a movable current measuring device which travels in the first direction and measures current as a function of position in the first direction, referred to as movable position current measurements and wherein the movable position current measurements comprise position dependent variations and temporal variations;
a reference current measuring device used to create reference position current measurements that comprise temporal variations; and
a controller, wherein the controller uses the movable position current measurements and the reference position current measurements to create a corrected beam current profile, wherein the reference position current measurements are used to create a beam current profile having temporal variations, and the corrected beam current profile is generated by subtracting the beam current profile having temporal variations from the movable position current measurements for all positions in the first direction.