| CPC G11C 11/161 (2013.01) [H01F 10/3259 (2013.01); H01F 10/3286 (2013.01); H01F 10/329 (2013.01); H01F 41/32 (2013.01); H10B 61/00 (2023.02); H10N 50/01 (2023.02); H10N 50/80 (2023.02); H10N 50/85 (2023.02)] | 4 Claims |

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1. A method of forming a spin-transfer torque (STT) magnetoresistive memory device, comprising:
forming a reference layer having a fixed magnetization direction;
forming a nonmagnetic tunnel barrier layer over the reference layer; and
forming a free layer stack on the non-magnetic tunnel barrier layer by sequentially forming a proximal ferromagnetic layer, an intermediate ferromagnetic layer, a magnesium layer on a top surface of the intermediate ferromagnetic layer, a non-magnetic metal sub-monolayer having a thickness in a range from 0.1 Angstrom to 0.3 Angstrom and comprising tungsten, and a distal ferromagnetic layer;
wherein the proximal ferromagnetic layer comprises a proximal CoFeB layer, the intermediate ferromagnetic layer comprises an intermediate CoFe layer, and the distal ferromagnetic layer comprises a distal CoFe layer; and
wherein the magnesium layer is removed during formation of the non-magnetic metal sub-monolayer by atoms of the tungsten impinging on the magnesium layer.
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