US 12,282,263 B2
Metrology system and lithographic system
Simon Reinald Huisman, Eindhoven (NL); and Sebastianus Adrianus Goorden, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 18/036,788
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Nov. 1, 2021, PCT No. PCT/EP2021/080241
§ 371(c)(1), (2) Date May 12, 2023,
PCT Pub. No. WO2022/106182, PCT Pub. Date May 27, 2022.
Claims priority of application No. 20207987 (EP), filed on Nov. 17, 2020.
Prior Publication US 2023/0418168 A1, Dec. 28, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 9/7046 (2013.01); G03F 9/7088 (2013.01); G03F 9/7019 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A metrology system comprising:
a pre-alignment metrology tool configured to measure a plurality of targets on a substrate to obtain measurement data; and
a processing unit configured to:
process the measurement data to determine for each target at least one position distribution that describes variation of the position value over at least part of the target; and
determine a measurement correction from the at least one position distribution that corrects for within-target variation in each of the targets, the measurement correction being used to correct measurements performed by an alignment sensor.