US 12,282,261 B2
Systems and methods for direct laser writing
Sridhar Krishnaswamy, Lake Forest, IL (US); Heming Wei, Shanghai (CN); Wisnu Hadibrata, Evanston, IL (US); and Koray Aydin, Wilmette, IL (US)
Assigned to Northwestern University, Evanston, IL (US)
Filed by Northwestern University, Evanston, IL (US)
Filed on Nov. 1, 2021, as Appl. No. 17/515,841.
Claims priority of provisional application 63/109,454, filed on Nov. 4, 2020.
Prior Publication US 2022/0171293 A1, Jun. 2, 2022
Int. Cl. G03F 7/00 (2006.01); B29C 64/153 (2017.01); B29C 64/245 (2017.01); B29C 64/268 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); G02B 1/00 (2006.01); G02B 6/10 (2006.01)
CPC G03F 7/70416 (2013.01) [G02B 6/107 (2013.01); G03F 7/0037 (2013.01); B29C 64/153 (2017.08); B29C 64/245 (2017.08); B29C 64/268 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); G02B 1/002 (2013.01)] 15 Claims
OG exemplary drawing
 
8. A method of fabricating an object via multi-directional direct laser lithography, the method comprising:
(a) illuminating a photosensitive composition with light focused along a first optical path, thereby inducing a multiphoton process within the photosensitive composition to generate a region of the object;
(b) illuminating the photosensitive composition with light focused along a second optical path different from the first optical path, thereby inducing another multiphoton process within the photocenter composition to generate a second region of the object; and
(c) illuminating the photosensitive composition with light focused along a third optical path different from the first and second optical paths, thereby inducing another multiphoton process within the photosensitive composition to generate a third region of the object.