	US 12,282,257 B2
	Pellicle for flat panel display photomask
Bryan S. Kasprowicz, Dallas, TX (US); and Christopher Progler, Plano, TX (US)
Assigned to PHOTRONICS, INC., Brookfield, CT (US)
Filed by PHOTRONICS, INC., Brookfield, CT (US)
Filed on Apr. 29, 2024, as Appl. No. 18/649,060.
Application 18/649,060 is a continuation of application No. 17/991,084, filed on Nov. 21, 2022, granted, now 12,013,642.
Application 17/991,084 is a continuation of application No. 17/444,927, filed on Aug. 12, 2021, granted, now 11,537,050, issued on Dec. 27, 2022.
Application 17/444,927 is a continuation of application No. 16/568,365, filed on Sep. 12, 2019, granted, now 11,119,403, issued on Sep. 14, 2021.
Claims priority of provisional application 62/730,119, filed on Sep. 12, 2018.
Prior Publication US 2024/0280908 A1, Aug. 22, 2024
Int. Cl. G03F 7/20 (2006.01); G03F 1/38 (2012.01); G03F 1/62 (2012.01); G03F 1/64 (2012.01)

CPC G03F 7/2002 (2013.01) [G03F 1/38 (2013.01); G03F 1/62 (2013.01); G03F 1/64 (2013.01)]

19 Claims

1. A method of making a flat panel display, comprising:

obtaining large area mask blank manufacturing data corresponding to a plurality of large area mask blanks;

simulating performance of the plurality of large area mask blanks by overlaying pattern data associated with at least one circuit pattern on the large area mask blank manufacturing data;

optimizing a photolithographic process based on the simulated performance by pairing one of the plurality of large area mask blanks with the pattern data, the step of optimizing comprising selecting an optimum mask blank as the one of the plurality of large area mask blanks; and

manufacturing a large area photomask using the one of the plurality of large area mask blanks.