US 12,282,254 B2
Photoresist compositions and pattern formation methods
Irvinder Kaur, Northborough, MA (US); Charlotte Cutler, Hopkinton, MA (US); Ke Yang, Cupertino, CA (US); and Mingqi Li, Shrewsbury, MA (US)
Assigned to DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US)
Filed by ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US)
Filed on Sep. 30, 2021, as Appl. No. 17/491,001.
Prior Publication US 2023/0161257 A1, May 25, 2023
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0397 (2013.01) [G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/327 (2013.01)] 17 Claims
 
1. A polymer, comprising:
a first repeating unit derived from a first monomer comprising a single ester acetal group;
a second repeating unit derived from a second monomer comprising a plurality of ester acetal groups; and
a repeating unit comprising a lactone group, wherein the repeating unit comprising the lactone group is structurally different from the first repeating unit and the second repeating unit,
wherein the second monomer is of Formula (5):

OG Complex Work Unit Chemistry
wherein, in Formula (5),
Re and Rf are each independently hydrogen, fluorine, cyano, or substituted or unsubstituted C1-10 alkyl;
R13, R14, R15, and R16 are each independently hydrogen, substituted or unsubstituted C1-20 alkyl, substituted or unsubstituted C3-20 cycloalkyl, substituted or unsubstituted C3-20 heterocycloalkyl, substituted or unsubstituted C6-20 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-20 heteroaryl, substituted or unsubstituted C4-30 heteroarylalkyl, or substituted or unsubstituted C4-30 alkylheteroaryl;
at least one of R13, R14, R15, or R16 is not hydrogen;
R13 and R14 optionally together form a ring via a single bond or a divalent linking group;
R15 and R16 optionally together form a ring via a single bond or a divalent linking group; and
Z is a divalent linking group.