US 12,282,184 B1
Reflectors applied to photonics platforms
Tai-Chun Huang, New Taipei (TW); and Stefan Rusu, Sunnyvale, CA (US)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Jul. 19, 2024, as Appl. No. 18/778,773.
Int. Cl. F21V 8/00 (2006.01); G02B 6/02 (2006.01)
CPC G02B 6/0055 (2013.01) [G02B 6/021 (2013.01); G02B 6/02123 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of forming an optical device comprising:
forming a first reflector layer;
forming a cladding layer on the first reflector layer;
forming a grating layer on the cladding layer; and
forming a second reflector layer on the cladding layer, wherein the second reflector layer comprises an opening.