| CPC G01N 33/0006 (2013.01) [B09B 1/006 (2013.01); B09B 3/80 (2022.01); E21B 36/00 (2013.01); E21B 36/003 (2013.01); E21B 47/06 (2013.01); E21B 49/08 (2013.01); G01N 1/2294 (2013.01); G01N 33/0036 (2013.01); G01N 33/004 (2013.01); E21B 47/07 (2020.05); E21B 49/0875 (2020.05); Y02C 20/20 (2013.01); Y02W 30/20 (2015.05)] | 20 Claims |

|
1. A control system for calibrating a sensor device, the control system comprising:
a gas analysis sample chamber;
a first port coupled to the gas analysis sample chamber, wherein the first port enables a sample of landfill gas to flow into the gas analysis sample chamber;
the sensor device, the sensor device being disposed within the gas analysis sample chamber and configured to measure a characteristic of the sample of landfill gas;
a valve coupled to the gas analysis sample chamber so as to enable a first gas sample comprising a first mixture of gasses of known composition and a second gas sample comprising a second mixture of gasses of known composition to flow to the sensor device; and
at least one controller configured to:
control the valve to allow the first gas sample and the second gas sample to flow to the sensor device;
obtain a measured concentration of a first type of gas in the first gas sample and a measured concentration of the first type of gas in the second gas sample; and
calibrate the sensor device based on: (1) a comparison between the measured concentration of the first type of gas in the first gas sample and an expected concentration of the first type of gas in the first gas sample and; (2) a comparison between the measured concentration of the first type of gas in the second gas sample and an expected concentration of the first type of gas in the second gas sample.
|