US 12,281,378 B2
Mask
Lin Sun, Jiangsu (CN); Jingjing Zhao, Jiangsu (CN); and Mingxing Liu, Jiangsu (CN)
Assigned to KunShan Go-Visionox Opto-Electronics Co., Ltd., Kunshan (CN)
Filed by KunShan Go-Visionox Opto-Electronics Co., Ltd., Jiangsu (CN)
Filed on Sep. 2, 2021, as Appl. No. 17/465,146.
Application 17/465,146 is a continuation of application No. PCT/CN2020/086112, filed on Apr. 22, 2020.
Claims priority of application No. 201910813249.7 (CN), filed on Aug. 30, 2019.
Prior Publication US 2021/0395874 A1, Dec. 23, 2021
Int. Cl. C23C 14/04 (2006.01); C23C 14/24 (2006.01)
CPC C23C 14/042 (2013.01) [C23C 14/24 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A mask, comprising:
an opening area comprising an opening pattern; and
a shelter area adjacent to the opening area, the shelter area comprising a buffer pattern adapted to the opening pattern; wherein the opening pattern comprises a plurality of opening units, the buffer pattern comprises a plurality of buffer units, and an opening unit set is formed by the plurality of opening units adjacent to the shelter area, a buffer unit set is formed by the plurality of buffer units and has an adaptation with the opening unit set; an adaptation relationship between the buffer unit set and the opening unit set is that adjacent opening unit and buffer unit in the same column have the same length in a row direction, and adjacent opening unit and buffer unit in the same row have the same length in a column direction; and thicknesses of the opening area and the shelter area are the same, the buffer unit set comprises a plurality of buffer strips surrounding the opening unit set, and each of the buffer strips is formed by the plurality of buffer units corresponding to the opening units in the opening unit set, the plurality of buffer strips comprise a first buffer strip and a second buffer strip circumferentially surrounding the first buffer strip, the second buffer strip comprises a plurality of second buffer grooves formed on a lower surface of the mask, and the plurality of second buffer grooves penetrate the lower surface of the mask but do not penetrate an upper surface of the mask.