US 12,281,130 B2
Organometallic precursor compound
Sung Jun Ji, Gyeonggi-do (KR); Sun Young Baik, Gyeonggi-do (KR); and Tae Young Lee, Gyeonggi-do (KR)
Assigned to EGTM Co., Ltd., (KR)
Filed by EGTM Co., Ltd., Gyeonggi-do (KR)
Filed on Nov. 22, 2021, as Appl. No. 17/532,612.
Claims priority of application No. 10-2020-0177372 (KR), filed on Dec. 17, 2020.
Prior Publication US 2022/0194967 A1, Jun. 23, 2022
Int. Cl. C07F 7/00 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01)
CPC C07F 7/00 (2013.01) [C23C 16/0218 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01)] 3 Claims
OG exemplary drawing
 
1. An organometallic precursor compound represented by the following Chemical Formula 1:

OG Complex Work Unit Chemistry
in Chemical Formula 1 above,
R1, R2, R3, R4, and R5 are each independently selected from the group consisting of hydrogen, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms,
M is selected from metal elements belonging to group 4 on the Periodic Table,
R6, R7, and R8 are each independently selected from the group consisting of hydrogen, a linear alkyl group having 1 to 5 carbon atoms, and a branched alkyl group having 3 to 5 carbon atoms,
X1 is each independently selected from organic groups represented by the following Chemical Formula 2a or 2b:

OG Complex Work Unit Chemistry
A.
in Chemical Formulas 2a and 2b above,
B. R9, R10, and R11are each independently selected from the group consisting of hydrogen, a linear alkyl group having 1 to 5 carbon atoms, and a branched alkyl group having 3 to 5 carbon atoms.