	US 12,281,047 B2
	Low temperature co-fired dielectric material and preparation method thereof
Shiwo Ta, Guangdong (CN); Xiaozhou Wang, Canberra (AU); Tao Chen, Guangdong (CN); Yun Liu, Canberra (AU); Terry James Frankcombe, Canberra (AU); Zhenxiao Fu, Guangdong (CN); Xiuhua Cao, Guangdong (CN); and Chunyuan Hu, Guangdong (CN)
Assigned to GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD., Zhaoqing (CN)
Filed by GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD., Guangdong (CN)
Filed on May 3, 2021, as Appl. No. 17/246,742.
Application 17/246,742 is a continuation in part of application No. PCT/CN2020/082252, filed on Mar. 31, 2020.
Claims priority of application No. 202010221314.X (CN), filed on Mar. 25, 2020.
Prior Publication US 2021/0309578 A1, Oct. 7, 2021
Int. Cl. C04B 35/488 (2006.01); C04B 35/14 (2006.01); C04B 35/624 (2006.01); C04B 35/626 (2006.01); C04B 35/64 (2006.01)

CPC C04B 35/488 (2013.01) [C04B 35/14 (2013.01); C04B 35/624 (2013.01); C04B 35/6261 (2013.01); C04B 35/64 (2013.01); C04B 2235/3201 (2013.01); C04B 2235/3208 (2013.01); C04B 2235/3244 (2013.01); C04B 2235/3409 (2013.01); C04B 2235/3418 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/656 (2013.01)]

8 Claims

1. A low temperature co-fired dielectric material, wherein the low temperature co-fired dielectric material consists of a zirconia main phase and a silicon-based amorphous filler, a weight ratio of the zirconia main phase to the silicon-based amorphous filler is (40-65):(35-60); a weight percentage of SiO₂in the silicon-based amorphous filler is ≥50%;

wherein the low temperature co-fired dielectric material consists of the following components in percentage by weight: ZrO₂40-65%, SiO₂27.03-46.33%, Na₂O 0.27-0.46%, K₂O 1.23-2.11%, CaO 0.73-1.26% and B₂O₃5.73-9.83%, and a total percentage of the components listed by weight is 100%;

wherein the low temperature co-fired dielectric material has a dielectric constant ranging from 7 to 12.