| CPC B23K 26/04 (2013.01) [B23K 26/032 (2013.01); B23K 26/082 (2015.10); B23K 26/083 (2013.01); B23K 26/362 (2013.01); H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01L 21/268 (2013.01); H01L 21/67282 (2013.01); H01L 23/544 (2013.01); B23K 2101/36 (2018.08); H01J 37/28 (2013.01); H01L 2223/54426 (2013.01)] | 20 Claims |

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1. A method of using a material processing system which comprises a particle beam column configured to direct a particle beam at a first processing region and a laser scanner configured to direct a laser beam at a second processing region, the method comprising:
scanning a first mark placed on an object with the particle beam;
scanning the first mark with the laser beam a first time and producing a second mark on the object with the laser beam;
scanning the second mark with the particle beam; and
scanning the first mark with the laser beam a second time and removing material of the object with the laser beam based on the scanning of the second mark with the particle beam.
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