| CPC B22F 10/85 (2021.01) [B22F 12/90 (2021.01); B33Y 50/02 (2014.12)] | 14 Claims |

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1. An additive manufacturing path generation apparatus comprising:
formation path generation circuitry to divide an additive manufacturing object into layers that are units of formation of the additive manufacturing object such that a formation height of a bead for each of formation paths that are paths for formation of the layers does not exceed an upper limit and generate the formation paths from layer definition information and a formation path surface, the layer definition information defining division of the additive manufacturing object into the layers, the formation path surface being a surface restricting positions of the formation paths; and
formation path correction circuitry to correct the formation path such that the formation path corrected at least in part includes a portion where a plurality of the layers before correction are collectively formed, and that the formation height for the formation path corrected falls within a range between the upper limit and a lower limit.
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