US 12,280,325 B2
Porous composite structure, method of preparing the same, article including the same, and air purifier including the same
Hyoungwoo Choi, Hwaseong-si (KR); Hyomin Lee, Pohang-si (KR); Min Ryu, Pohang-si (KR); Jinkyu Kang, Hwaseong-si (KR); Joonseon Jeong, Seoul (KR); Dongwook Kim, Suwon-si (KR); Daehoon Park, Paju-si (KR); and Hyun Chul Lee, Hwaseong-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-Do (KR); and POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION, Gyeongsangbuk-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR); and POSTECH Research and Business Development Foundation, Pohang-si (KR)
Filed on May 23, 2022, as Appl. No. 17/750,884.
Claims priority of application No. 10-2021-0066493 (KR), filed on May 24, 2021; and application No. 10-2022-0026218 (KR), filed on Feb. 28, 2022.
Prior Publication US 2022/0370937 A1, Nov. 24, 2022
Int. Cl. B01D 47/06 (2006.01); B01D 39/20 (2006.01); B01D 46/00 (2022.01); B01D 46/02 (2006.01); B05D 5/08 (2006.01); B82B 3/00 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01)
CPC B01D 39/2072 (2013.01) [B01D 46/0001 (2013.01); B01D 46/02 (2013.01); B01D 47/06 (2013.01); B05D 5/08 (2013.01); B82B 3/0019 (2013.01); B82B 3/0047 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); B01D 2201/184 (2013.01)] 30 Claims
OG exemplary drawing
 
1. A porous composite structure, comprising:
a substrate comprising a plurality of nanostructures;
a particle layer disposed on a surface of the substrate;
a liquid; and
an interlayer, wherein the interlayer is disposed on the surface of the substrate, and the particle layer is disposed on a surface of the interlayer,
wherein the interlayer comprises a hydrolyzed, dehydrated and condensed product of a compound represented by Formula 1:
H2N—R1—Si(OR2)3  Formula 1
wherein, in Formula 1,
R1 is a C1-C20 alkylene group or a C6-C20 arylene group, and
R2 is hydrogen, a C1-C20 alkyl group, a C6-C20 aryl group, or Cl.