CPC H05G 2/006 (2013.01) [G03F 7/70033 (2013.01); H05G 2/008 (2013.01)] | 40 Claims |
1. An apparatus for supplying a target material, the apparatus comprising:
a first reservoir system comprising a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, the first fluid reservoir maintained at a first pressure;
a second reservoir system comprising a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system;
a priming system configured to receive a solid matter that includes a target material and to produce a fluid target material from the solid matter, the priming system maintained at a priming pressure that is less than the first pressure; and
a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system, wherein the fluid control system is configured to:
isolate at least one fluid reservoir and the nozzle supply system from the priming system during operation of the nozzle supply system, and
maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system during operation of the nozzle supply system.
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