US 11,961,730 B2
Plasma generating device
Naoki Takahashi, Tokyo (JP)
Assigned to ATONARP INC., Tokyo (JP)
Appl. No. 17/912,226
Filed by ATONARP INC., Tokyo (JP)
PCT Filed Mar. 29, 2021, PCT No. PCT/JP2021/013168
§ 371(c)(1), (2) Date Sep. 16, 2022,
PCT Pub. No. WO2021/200773, PCT Pub. Date Oct. 7, 2021.
Claims priority of application No. 2020-062862 (JP), filed on Mar. 31, 2020.
Prior Publication US 2023/0187195 A1, Jun. 15, 2023
Int. Cl. H01J 49/10 (2006.01); H01J 49/42 (2006.01); H05H 1/30 (2006.01)
CPC H01J 49/105 (2013.01) [H05H 1/30 (2013.01); H01J 49/4215 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A gas analyzer apparatus comprising:
a that generates microplasma and includes:
a chamber which is equipped with a dielectric wall structure and into which gas to be plasmarized flows;
an RF supplying mechanism that generates the plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and
a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber;
a sampling unit that supplies a sample gas to be measured to the chamber;
an analyzer unit that analyzes the sample gas via the generated plasma; and
a potential control unit that controls a floating potential of the plasma using the floating potential supplying mechanism so that the plasma flows into the analyzer unit.