CPC H01J 49/105 (2013.01) [H05H 1/30 (2013.01); H01J 49/4215 (2013.01)] | 12 Claims |
1. A gas analyzer apparatus comprising:
a that generates microplasma and includes:
a chamber which is equipped with a dielectric wall structure and into which gas to be plasmarized flows;
an RF supplying mechanism that generates the plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and
a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber;
a sampling unit that supplies a sample gas to be measured to the chamber;
an analyzer unit that analyzes the sample gas via the generated plasma; and
a potential control unit that controls a floating potential of the plasma using the floating potential supplying mechanism so that the plasma flows into the analyzer unit.
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