US 11,961,697 B2
Apparatus using charged particle beams
Xuerang Hu, San Jose, CA (US); Xuedong Liu, San Jose, CA (US); Weiming Ren, San Jose, CA (US); and Zhong-Wei Chen, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on May 5, 2023, as Appl. No. 18/144,131.
Application 18/144,131 is a continuation of application No. 16/753,285, granted, now 11,670,477, previously published as PCT/EP2018/076707, filed on Oct. 2, 2018.
Claims priority of provisional application 62/567,134, filed on Oct. 2, 2017.
Prior Publication US 2023/0411110 A1, Dec. 21, 2023
Int. Cl. H01J 37/09 (2006.01); H01J 37/12 (2006.01); H01J 37/14 (2006.01); H01J 37/147 (2006.01); H01J 37/15 (2006.01); H01J 37/153 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/09 (2013.01) [H01J 37/12 (2013.01); H01J 37/1472 (2013.01); H01J 37/153 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/1205 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A source-conversion unit comprising:
an image-forming element array having a plurality of image-forming elements configured to form a plurality of images of a charged-particle source by influencing a plurality of beamlets of a primary charged particle beam generated by the charged-particle source; and
an aberration compensator array having a plurality of micro-compensators configured to compensate aberrations of the plurality of images, wherein each micro-compensator comprises a micro-lens element placed in one layer of a first set of layers and a micro-stigmator element placed in another layer of the first set of layers,
wherein a layer of the first set of layers includes at least one micro-lens element and at least one micro-stigmator element.