CPC G03F 7/0045 (2013.01) [C07C 25/18 (2013.01); C07C 255/24 (2013.01); C07C 255/31 (2013.01); C07C 255/34 (2013.01); C07C 321/28 (2013.01); C07C 381/12 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/091 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); C07C 2602/08 (2017.05); C07C 2603/74 (2017.05)] | 11 Claims |
1. A photoresist composition, comprising:
an acid-sensitive polymer,
a solvent, and
a photoacid generator compound having Formula (II):
wherein:
X1, X2, X3 and X−4 are each independently an electron-withdrawing group;
Y is a single bond or linking group;
R is hydrogen; and
M+ is an organic cation,
provided that the anion of the photoacid generator compound does not simultaneously include three electron-withdrawing —S(═O)2-perfluoroalkyl groups.
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7. A photoresist composition, comprising:
an acid-sensitive polymer,
a solvent, and
a photoacid generator compound having Formula (III):
wherein:
X5 and X6 are each independently an electron withdrawing group selected from C(CN)2, C(NO2)2, C(COR27)2, C(CO2R28)2, C(SO2R29)2, and C(Rf)2, wherein R27, R28, and R29 are each independently a C1-30 aliphatic organic group, a C6-30 aromatic organic group, or a C1-30 heteroaromatic organic group, and wherein Rf is a C1-30 fluoroalkyl group;
Z1 and Z2 are each independently hydrogen, a straight chain C1-50 alkyl group, a branched C3-50 alkyl group, a monocyclic or polycyclic C3-50 cycloalkyl group, a monocyclic or polycyclic C3-50 heterocycloalkyl group; a monocyclic or polycyclic C6-50 aryl group, a monocyclic or polycyclic C3-20 heteroaryl group, or a combination thereof;
Y is a single bond or a linking group;
R is hydrogen; and
M+ is an organic cation;
provided that the anion of the photoacid generator compound does not simultaneously include three electron-withdrawing —S(═O)2-perfluoroalkyl groups.
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