US 11,960,206 B2
Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
Emad Aqad, Northborough, MA (US); William Williams, III, Ipswich, MA (US); and James F. Cameron, Brookline, MA (US)
Assigned to ROHM AND HASS ELECTRONIC MATERIALS LLC, Marlborough, MA (US)
Filed by ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US)
Filed on Dec. 6, 2022, as Appl. No. 18/075,594.
Application 18/075,594 is a continuation of application No. 15/387,788, filed on Dec. 22, 2016, granted, now 11,550,217.
Claims priority of provisional application 62/273,523, filed on Dec. 31, 2015.
Prior Publication US 2023/0094313 A1, Mar. 30, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/004 (2006.01); C07C 25/18 (2006.01); C07C 255/24 (2006.01); C07C 255/31 (2006.01); C07C 255/34 (2006.01); C07C 321/28 (2006.01); C07C 381/12 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 25/18 (2013.01); C07C 255/24 (2013.01); C07C 255/31 (2013.01); C07C 255/34 (2013.01); C07C 321/28 (2013.01); C07C 381/12 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/091 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); C07C 2602/08 (2017.05); C07C 2603/74 (2017.05)] 11 Claims
 
1. A photoresist composition, comprising:
an acid-sensitive polymer,
a solvent, and
a photoacid generator compound having Formula (II):

OG Complex Work Unit Chemistry
wherein:
X1, X2, X3 and X−4 are each independently an electron-withdrawing group;
Y is a single bond or linking group;
R is hydrogen; and
M+ is an organic cation,
provided that the anion of the photoacid generator compound does not simultaneously include three electron-withdrawing —S(═O)2-perfluoroalkyl groups.
 
7. A photoresist composition, comprising:
an acid-sensitive polymer,
a solvent, and
a photoacid generator compound having Formula (III):

OG Complex Work Unit Chemistry
wherein:
X5 and X6 are each independently an electron withdrawing group selected from C(CN)2, C(NO2)2, C(COR27)2, C(CO2R28)2, C(SO2R29)2, and C(Rf)2, wherein R27, R28, and R29 are each independently a C1-30 aliphatic organic group, a C6-30 aromatic organic group, or a C1-30 heteroaromatic organic group, and wherein Rf is a C1-30 fluoroalkyl group;
Z1 and Z2 are each independently hydrogen, a straight chain C1-50 alkyl group, a branched C3-50 alkyl group, a monocyclic or polycyclic C3-50 cycloalkyl group, a monocyclic or polycyclic C3-50 heterocycloalkyl group; a monocyclic or polycyclic C6-50 aryl group, a monocyclic or polycyclic C3-20 heteroaryl group, or a combination thereof;
Y is a single bond or a linking group;
R is hydrogen; and
M+ is an organic cation;
provided that the anion of the photoacid generator compound does not simultaneously include three electron-withdrawing —S(═O)2-perfluoroalkyl groups.