US 11,959,174 B2
Shunt door for magnets in plasma process chamber
Kallol Bera, Fremont, CA (US); Sathya Swaroop Ganta, Sunnyvale, CA (US); Timothy Joseph Franklin, Campbell, CA (US); Kaushik Alayavalli, Sunnyvale, CA (US); Akshay Dhanakshirur, Hubli (IN); Stephen C. Garner, Newark, CA (US); and Bhaskar Kumar, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 22, 2020, as Appl. No. 17/131,315.
Claims priority of application No. 202041008541 (IN), filed on Feb. 28, 2020.
Prior Publication US 2021/0269919 A1, Sep. 2, 2021
Int. Cl. C23C 16/52 (2006.01); C23C 16/505 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01)
CPC C23C 16/52 (2013.01) [C23C 16/505 (2013.01); C23C 16/54 (2013.01); H01J 37/32082 (2013.01); H01J 37/32174 (2013.01); H01J 37/3266 (2013.01); H01J 37/32669 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
a chamber comprising:
an interior volume and an exterior sidewall disposed around the interior volume; and
a substrate support in the interior volume;
a rotational magnetic housing disposed about the exterior sidewall of the chamber, the rotational magnetic housing comprising:
a sleeve;
a plurality of magnets coupled to the sleeve, the plurality of magnets configured to travel along a path around the chamber when the rotational magnetic housing is rotated around the chamber; and
a plurality of shunt doors disposed between the chamber and the sleeve; and
a controller configured to execute instructions to cause each of the shunt doors to move relative to the magnets from an open position to a closed position to shield the interior volume of the chamber from magnetic fields from the plurality of magnets when in the closed position and to reduce an intensity of the magnetic fields in the interior volume in the closed position relative to the open position.