CPC C23C 16/482 (2013.01) [C23C 16/24 (2013.01); C23C 16/30 (2013.01); C23C 16/52 (2013.01); G01J 5/0007 (2013.01); G01K 7/10 (2013.01); H01L 29/66742 (2013.01); H01L 29/66795 (2013.01)] | 18 Claims |
1. A method of forming a structure, comprising:
providing a substrate in a reaction chamber;
forming a first layer overlaying the substrate;
forming a second layer onto the first layer;
wherein temperature of the first layer is controlled during forming the first layer using infrared electromagnetic radiation emitted by the first layer; and
wherein temperature of the second layer is controlled during forming the second layer using infrared electromagnetic radiation emitted by the second layer.
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