US 12,279,514 B2
Display panel, manufacturing method thereof, and mobile terminal
Rongkun Chen, Wuhan (CN)
Assigned to Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan (CN)
Appl. No. 17/613,963
Filed by Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan (CN)
PCT Filed Sep. 30, 2021, PCT No. PCT/CN2021/122307
§ 371(c)(1), (2) Date Nov. 24, 2021,
PCT Pub. No. WO2023/035347, PCT Pub. Date Mar. 16, 2023.
Claims priority of application No. 202111063543.4 (CN), filed on Sep. 10, 2021.
Prior Publication US 2024/0032410 A1, Jan. 25, 2024
Int. Cl. H10K 77/10 (2023.01); B32B 15/08 (2006.01); B32B 15/09 (2006.01); B32B 15/18 (2006.01); B32B 27/28 (2006.01); B32B 27/36 (2006.01); C25D 7/12 (2006.01); H10K 102/00 (2023.01)
CPC H10K 77/111 (2023.02) [B32B 15/08 (2013.01); B32B 15/09 (2013.01); B32B 15/18 (2013.01); B32B 27/281 (2013.01); B32B 27/36 (2013.01); C25D 7/12 (2013.01); B32B 2255/06 (2013.01); B32B 2255/205 (2013.01); B32B 2457/206 (2013.01); H10K 2102/311 (2023.02)] 14 Claims
OG exemplary drawing
 
1. A display panel, comprising:
a panel main body;
a backboard disposed on one side of the panel main body; and
a supporting layer disposed on one side of the backboard away from the panel main body;
wherein a shading thin film is disposed between the backboard and the supporting layer, and the shading thin film is laminated on one side of the backboard close to the supporting layer or on one side of the supporting layer close to the backboard;
wherein a material of the shading thin film comprises ink or metal;
wherein the display panel comprises a bending area, the supporting layer comprises a first stress reduction pattern located at the bending area;
wherein a material of the shading thin film is tin-nickel alloy, the shading thin film comprises a second stress reduction pattern located at the bending area, and in a direction perpendicular to the supporting layer, an orthographic projection of the first stress reduction pattern coincides an orthographic projection of the second stress reduction pattern.