US 12,279,452 B2
Stacked complementary transistor structure for three-dimensional integration
Kangguo Cheng, Schenectady, NY (US); Shogo Mochizuki, Mechanicville, NY (US); and Juntao Li, Cohoes, NY (US)
Assigned to International Business Machines Corporation, Armonk, NY (US)
Filed by International Business Machines Corporation, Armonk, NY (US)
Filed on Dec. 15, 2021, as Appl. No. 17/551,309.
Prior Publication US 2023/0187551 A1, Jun. 15, 2023
Int. Cl. H10D 30/69 (2025.01); H01L 23/528 (2006.01); H10D 30/01 (2025.01); H10D 30/67 (2025.01); H10D 64/01 (2025.01); H10D 64/23 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/85 (2025.01)
CPC H10D 30/797 (2025.01) [H01L 23/5286 (2013.01); H10D 30/031 (2025.01); H10D 30/6713 (2025.01); H10D 30/6729 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 64/01 (2025.01); H10D 64/258 (2025.01); H10D 84/0167 (2025.01); H10D 84/017 (2025.01); H10D 84/0172 (2025.01); H10D 84/0186 (2025.01); H10D 84/038 (2025.01); H10D 84/85 (2025.01)] 20 Claims
OG exemplary drawing
 
1. A device comprising:
a first interconnect structure;
a second interconnect structure;
a stacked complementary transistor structure disposed between the first and second interconnect structures, wherein the stacked complementary transistor structure comprises a first transistor of a first type, and a second transistor of a second type which is opposite the first type;
a first contact connecting a first source/drain element of the first transistor to the first interconnect structure; and
a second contact connecting a first source/drain element of the second transistor to the second interconnect structure;
wherein the first and second contacts are disposed in alignment with each other; and
wherein the first source/drain element of the second transistor comprises an extended portion which extends beyond a gate of the second transistor towards the second interconnect structure.