CPC H10D 12/441 (2025.01) [H10D 62/393 (2025.01)] | 20 Claims |
1. An insulated gate bipolar transistor, comprising a semiconductor substrate, the semiconductor substrate comprising:
a collector region doped in a first type, wherein the collector region comprises a bump region;
a first drift region doped in a second type and a second drift region doped in the second type, wherein the first drift region and the second drift region are located on a side of the collector region having the bump region, a profile contour of the first drift region matches a profile contour of the bump region, such that the second drift region does not contact the bump region, and a doping concentration of the first drift region is greater than a doping concentration of the second drift region; and
a first active region and a second active region, formed at two opposite ends of the second drift region, wherein each of the first active region and the second active region comprises:
a first type of well region, formed in the second drift region; and
an emission region doped in the second type, formed in the first type of well region; and wherein a portion of the bump region extends into a gap between the first active region and the second active region.
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