| CPC H01L 21/67034 (2013.01) [C23C 16/4412 (2013.01); H01L 21/02101 (2013.01); H01L 21/67253 (2013.01)] | 7 Claims |
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1. A substrate treating apparatus comprising:
a chamber providing an inner space;
a fluid supply unit configured to supply a treating fluid to the inner space;
a fluid exhaust unit configured to exhaust the treating fluid from the inner space; and
a controller configured to control the fluid supply unit and the fluid exhaust unit,
wherein the fluid exhaust unit comprises:
an exhaust line connected to the chamber; and
a pressure regulator installed at the exhaust line and configured to maintain a pressure of the inner space to a set pressure, and
wherein the fluid supply unit comprises:
a fluid supply source; and
a supply line provided between the fluid supply source and the chamber, and
wherein at least two flowmeters configured to measure a flow rate per unit time of the treating fluid flowing at the inner space is installed, and
wherein the at least two flowmeters include:
a first flowmeter installed at the supply line; and
a second flowmeter installed at the exhaust line,
wherein the controller receives measured flow rate values from the first flowmeter and the second flowmeter, and
checks whether the treating fluid is leaking from the inner space through a difference between the measured flow rate values,
wherein the controller is configured to control the fluid supply unit and the fluid exhaust unit to:
perform a pressurizing step for pressurizing the pressure of the inner space to the set pressure by supplying the treating fluid to the inner space, and a flow step for generating a flow of the treating fluid at the inner space by the fluid exhaust unit exhausting the treating fluid from the inner space while the treating fluid is supplied to the inner space, and
maintain constantly a flow rate per unit time of the treating fluid flowing within the inner space to a set flow rate at the flow step, and the pressure of the inner space to the set pressure at the flow step during the flow step,
wherein the set pressure is the same as a critical pressure for maintaining the treating fluid at a supercritical state at the inner space, or higher than the critical pressure.
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