CPC H01L 21/563 (2013.01) [C09J 7/38 (2018.01); C09J 7/405 (2018.01); C09J 163/00 (2013.01); H01L 24/92 (2013.01); C09J 2203/326 (2013.01); C09J 2463/00 (2013.01); C09J 2467/005 (2013.01); H01L 2224/92125 (2013.01)] | 9 Claims |
1. A method for manufacturing a semiconductor package, the method comprising:
(i) bonding an adhesive layer of an underfill film on a bump of a semiconductor chip provided with the bump;
(ii) picking up the bump of the semiconductor chip to which the adhesive layer is bonded, and aligning the bump on a bonding pad of a package substrate supported on a bonding stage;
(iii) putting the aligned semiconductor chip and package substrate into a pressure chamber oven;
(iv) melting the bump of the semiconductor chip to connect the semiconductor chip and the package substrate; and
(v) curing the adhesive layer disposed between the connected semiconductor chip and package substrate,
wherein the
adhesive layer has a melt viscosity in a range of 300 to 1000 Pa·s at 150 to 160° C., and has an onset temperature of 145±5° C. on a differential scanning calorimeter (DSC), and
the adhesive layer is a cured product or a semi-cured product of an adhesive resin composition, said adhesive resin composition comprising:
(a) at least three or more epoxy resin containing a liquid epoxy resin, a phenoxy resin, and a polyfunctional epoxy resin;
(b) an acid anhydride curing agent;
(c) a nitrogen (N)-containing heterocyclic compound; and
(d) a filler; and
wherein a mixing ratio of the polyfunctional epoxy resin, the phenoxy resin, and the liquid epoxy resin is 4:3 to 4:2 to 3 by weight.
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